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Near-ambient-pressure X-ray and ultraviolet photoelectron spectroscopies

X-ray photoelectron spectroscopy (XPS) is a surface-sensitive quantitative spectroscopic technique, which measures the elemental composition, empirical formula, chemical state, and electronic state of the top approximately 10 nm of a material. XPS spectra are obtained by irradiating the material with a beam of X-rays while simultaneously measuring the number of electrons emitted by the material in dependence on their kinetic energy.

Running the X-ray source and the electron analyzer requires high vacuum (p ~ 10−8 mbar) conditions in the analysis chamber and, therefore, conventional XPS is possible only under UHV conditions, making it difficult to conduct investigations of surfaces under real-world conditions (i.e. in the presence of gases and possibly liquids), such as is the case of interfacial chemical reactions in catalysis, chemical vapor deposition, electrochemistry, and environmental chemistry. Near-ambient-pressure XPS (NAP-XPS) is an XPS system capable of operating at pressures of a few tens of millibars. We can now probe chemical interactions on the atomic level for vapor–solid interfaces. NAP-XPS also allows to investigate electronic and structural properties of small organics.


Description of the apparatus


Dr. Peter Matvija

Asisstant Professor
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Dr. Michael Vorochta

Associate professor
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