Chemical reaction on model surfaces

The project focuses on the preparation of well-defined model surfaces in ultra-high vacuum (UHV) conditions using Ar ion sputtering, annealing, and physical vapor deposition (PVD). The prepared surfaces will be exposed to reactive environments. The structure and chemical properties of the prepared surfaces will be characterized after the preparation, during the exposure and after the exposure by the following methods: X-ray photoelectron spectroscopy (XPS), low-energy electron diffraction (LEED), scanning tunneling microscopy (STM).